个人简介
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杨香

时间:2024-01-22

 

 

副研究员

办公室

3号楼 308

电话

0108230 5403

传真

0108230 5141

电子邮件

xyang@semi.ac.cn

负责工艺

超净间安全培训、EBL、低温探针台、低温霍尔测试

 

个人简历

2009中国科学院半导体研究所 微电子学与固体电子学 工学博士

研究领域

  • 硅基/SOI纳电子器件

  • 硅基/SOIMEMS器件

成果出版

(1) Lin Chen, Xiang Yang, Fuhua Yang, Jianhua Zhao, Jennifer Misuraca, Peng Xiong, and Stephan von Moln_ar, Enhancing the Curie Temperature of Ferromagnetic Semiconductor (Ga,Mn)As to 200 K via Nanostructure Engineering, Nano Lett., 11, 2584 ( 2011) (3)(SCI)

(2) Zhang Yanbo, Du Yandong, Xiong Ying, Yang Xiang,Han Weihua and Yang Fuhua, Drive current of accumulation-mode p-channel SOI-based wrap-gated Fin-FETs, Journal of Semiconductors, 2011, 32(9):094001 (EI)

(3)XiangYang, Weihua Han, Ying Wang, Yang Zhang, Fuhua Yang, Fabrication of silicon crystal-facet-dependent nanostructures by electron-beam lithography, Journal of Semiconductors, 2008, 29(6):1057-1061 (EI)

(4)Weihua Han, XiangYang,Ying Wang, Yang Zhang, Fuhua Yang, Jinzhong Yu Fabrication method of silicon nanostructures by anisotropic etching, 2008 5th International Conference on Group IV Photonics, GFP, p 146-148, 2008 (EI)

(5)Ying Wang, Weihua Han, XiangYang, Jianjun Chen, Fuhua Yang Monostable-bistable transition logic element (MOBILE) model for single-electron transistors, International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT, p 393-395, 2008 (EI)

(6)Yanbo Zhang, Ying Xiong, Xiang Yang, Ying Wang, Weihua Han and Fuhua Yang

Experimental study on the subthreshold swing of silicon nanowire transistorsJournal of Nanoscience and Nanotechnology, v10P1-42010SCI

(7)Zhang, YangZhang, Renping; Han, Weihua; Liu, Jian; Yang, Xiang; Wang, Ying; Li, Chian Chiu; Yang, Fuhua Reduction of proximity effect in fabricating nanometer-spaced nanopillars by two-step exposureJournal of Semiconductors, v 30, n 11, p 116001-1-4November 2009(EI)

 

专利

1,杨香, 韩伟华, 王颖, 张杨, 杨富华,依赖晶面的三维限制硅纳米结构的制备方法,发明专利,申请号:200810224109.8

2,韩伟华,杨香,吴南健,杨富华,一种具有侧栅结构的硅基单电子记忆存储器及其制作方法,发明专利,申请号:200610114189

3,韩伟华,杨香,杨富华,具有双量子点接触结构的硅基单电子器件及其制作方法,发明专利,申请号:200710119834

4,韩伟华,杨香,杨富华,围栅控制结构的硅基单电子晶体管及其制作方法,发明专利,申请号 :200710119835

5,王颖,韩伟华,杨香,杨富华,环形孔阵列结构的二维光子晶体的制作方法,发明专利,申请号:200710304255.7


 

 

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