首 页 >> 单篇全文
Inductively coupled CH4H2 plasma etching process for mesa delineation of InAsGaSb type-II superlattice pixels [2025-05-16] |
| Inductively coupled CH4/H2 plasma etching process for mesa delineation of InAs/GaSb type-II superlattice pixels DOI： 10.1049/mnl.2018.5549 链接：https://doi.org/10.1049/mnl.2018.5549 Inductively_coupled_CH4H2_plasma_etching_process_for_mesa_delineation_of_InAsGaSb_type-II_superlattice_pixels.pdf |
